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Semiconductor Wafer Specifications Guide

Semiconductor wafer specifications cover diameter, thickness, crystal orientation, doping type and resistivity, edge geometry (flats or notch), surface finish, and tolerances on flatness, bow, and warp. Most silicon wafer dimensions follow SEMI (Semiconductor Equipment and Materials International) standards, which keep wafers interchangeable across fab tooling worldwide. Compound and wide-bandgap materials like silicon carbide (SiC), gallium nitride (GaN), gallium arsenide (GaAs), and indium phosphide (InP) follow similar conventions with material-specific thickness and defect specs. This guide covers the spec fields to define and verify before you place an order.

Silicon Wafer Diameter and Thickness Reference

Wafer thickness scales with diameter because larger wafers need more mechanical rigidity to resist bow, warp, and breakage during handling. The values below are typical nominal thicknesses in current industry use; exact figures vary by supplier, wafer generation, and application, so always confirm against the specific lot's data sheet or COA.

DiameterTypical ThicknessSEMI Standard Reference
2" (50.8 mm)~275–325 µmSEMI M1 (flats-based)
3" (76.2 mm)~375–425 µmSEMI M1 (flats-based)
100 mm (4")~525 µm ± 25 µmSEMI M1
125 mm (5")~625 µm ± 25 µmSEMI M1
150 mm (6")~675 µm ± 25 µmSEMI M1
200 mm (8")~725 µm ± 20 µmSEMI M1 (notch-based)
300 mm (12")~775 µm ± 20 µmSEMI M1 (notch-based)

Non-standard thicknesses (thinned, ultra-thin, or thick "power" wafers) are available on custom order but fall outside the ranges above — specify the exact thickness and tolerance you need in the RFQ.

Crystal Orientation: (100), (111), and (110)

Orientation describes which crystal plane is parallel to the wafer surface, and it changes how the wafer cleaves, etches, and performs electrically:

Flats vs. Notches

Orientation and dopant type are physically marked on the wafer edge so fab equipment and operators can identify them without additional testing:

Doping and Resistivity

Doping sets whether a wafer is n-type or p-type and, together with doping concentration, sets its resistivity:

Resistivity and doping concentration move inversely — more dopant atoms mean more free carriers and lower resistivity. Typical bands used across the industry:

Doping LevelTypical Resistivity RangeCommon Use
Lightly doped / high resistivityRoughly 10–10,000+ Ω·cmRF, radiation detectors, high-voltage devices (often FZ material)
Standard / medium dopedRoughly 1–10 Ω·cmGeneral CMOS and IC substrates
Heavily doped / low resistivityRoughly 0.001–0.02 Ω·cmDegenerate (n++/p++) substrates for power devices and low-resistance contacts

These bands are a general guide — exact resistivity depends on the specific ingot and should always be confirmed against a four-point-probe measurement and the lot's Certificate of Analysis.

Silicon Carbide (SiC): 4H vs. 6H

SiC substrates are specified by polytype, not just orientation, because different polytypes have meaningfully different electrical properties:

Property4H-SiC6H-SiC
Bandgap~3.23 eV~3.0 eV
Electron mobility~900 cm²/V·s~400 cm²/V·s
Typical usePower electronics: MOSFETs, Schottky diodes, high-voltage/high-frequency devicesLEDs, UV photodetectors, and specialty applications favouring its directional (anisotropic) properties
Commercial availabilityDominant polytype in the power device marketNiche/specialty availability

4H-SiC's higher electron mobility supports faster switching and lower on-resistance, which is why it dominates commercial power electronics, while 6H-SiC is reserved for applications where its specific optical or mechanical properties are the deciding factor.

Micropipe density (MPD): a micropipe is a hollow-core screw dislocation running along the crystal growth direction; it creates a leakage path and can compromise device yield. Research-grade SiC is often specified around MPD < 15 cm⁻², while modern production-grade substrates are typically specified as micropipe-free or MPD near 0–1 cm⁻² — a dramatic improvement over early-generation SiC material. SiC wafers are typically available from 2" up to 6" diameter, thinner than comparable silicon wafers at a given diameter; confirm exact thickness and MPD spec against the lot's data sheet.

How to Order: RFQ Checklist

Include the following fields in any wafer RFQ to get an accurate, fast quote:

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Mihron Metalyx sources silicon (CZ/FZ, 2"–12"), 4H/6H SiC (2"–6"), GaN-on-SiC and GaN-on-sapphire epiwafers, and GaAs/InP/GaSb/InAs/InSb substrates from a bonded Toronto warehouse, with wafer reclaim, dicing, and metrology services available and a Certificate of Analysis on every lot. Send us the spec fields above and we'll quote within 48 hours — no minimum order on standard silicon.

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Frequently asked questions

What is the standard thickness of a 200mm silicon wafer?

A 200mm (8-inch) silicon wafer typically has a nominal thickness of about 725 microns, with a tolerance of roughly plus or minus 20 microns, following SEMI M1 conventions. Exact thickness can vary by supplier and application, so confirm against the specific lot's data sheet.

How do you tell wafer orientation and doping type from the wafer itself?

Wafers under 200mm typically use a primary flat to indicate crystal orientation and a secondary flat, at a specific angle and length relative to the primary flat, to indicate dopant type. Wafers 200mm and larger use a single alignment notch for orientation, with dopant type specified in the accompanying documentation rather than the edge shape.

What is the difference between 4H-SiC and 6H-SiC?

4H-SiC has a wider bandgap (about 3.23 eV vs. about 3.0 eV) and more than double the electron mobility of 6H-SiC (about 900 cm²/V·s vs. about 400 cm²/V·s), which gives it faster switching and lower on-resistance. That makes 4H-SiC the dominant polytype for power electronics, while 6H-SiC is used mainly for LEDs, UV photodetectors, and specialty applications.

What is micropipe density and why does it matter for SiC wafers?

A micropipe is a hollow-core screw dislocation running through a SiC crystal along its growth direction; it creates a leakage path that can compromise device performance and yield. Research-grade SiC substrates are often specified around 15 micropipes per square centimetre or fewer, while modern production-grade material is typically specified as micropipe-free or near 0-1 per square centimetre.

What information should I include in a wafer RFQ?

A complete wafer RFQ should specify material, diameter, thickness and tolerance, crystal orientation, dopant type and resistivity range, grade (prime/test/dummy/reclaim), surface finish, flatness/bow/warp tolerance if non-standard, edge type (flat convention or notch), quantity, required lead time, and any documentation needed such as a Certificate of Analysis.

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